Specific Contact Resistance of CuxO Thin Films Deposited by r. f. Sputtering Method

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  • Dr. Jayanta Pal Department of Physics, Dr. B. C. Roy Engineering College, Jemua Road, Fuljhore, Durgapur- 713206, West Bengal, India

Klíčová slova:

CuxO thin films, contact resistivity, bulk resistivity

Abstrakt

This paper contains measurement of contact resistivity and bulk resistivity of CuxO (0<x<1) thin films deposited by r. f. sputtering method. The conditions for deposition of CuxO thin film were optimized by varying the r. f. power to vary the contact resistivity and bulk resistivity. Electrical characterizations were performed by Transmission Line Model (TLM) and Vertical Transmission Model (VTM) studies. The films deposited on glass substrate have contact resistivity in the range 2.53 - 15 W-cm2 and bulk resistivity in the range 0.35 - 0.96 W-cm.  Keywords: CuxO thin films, contact resistivity, bulk resistivity

Biografie autora

  • Dr. Jayanta Pal, Department of Physics, Dr. B. C. Roy Engineering College, Jemua Road, Fuljhore, Durgapur- 713206, West Bengal, India
    Department: Physics,Rank: Assistant Professor

Stažení

Publikováno

2012-11-30

Číslo

Vol 3 No 3 (2012)

Sekce

Research Articles

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