Specific Contact Resistance of CuxO Thin Films Deposited by r. f. Sputtering Method

Авторы

  • Dr. Jayanta Pal Department of Physics, Dr. B. C. Roy Engineering College, Jemua Road, Fuljhore, Durgapur- 713206, West Bengal, India

Ключевые слова:

CuxO thin films, contact resistivity, bulk resistivity

Аннотация

This paper contains measurement of contact resistivity and bulk resistivity of CuxO (0<x<1) thin films deposited by r. f. sputtering method. The conditions for deposition of CuxO thin film were optimized by varying the r. f. power to vary the contact resistivity and bulk resistivity. Electrical characterizations were performed by Transmission Line Model (TLM) and Vertical Transmission Model (VTM) studies. The films deposited on glass substrate have contact resistivity in the range 2.53 - 15 W-cm2 and bulk resistivity in the range 0.35 - 0.96 W-cm.  Keywords: CuxO thin films, contact resistivity, bulk resistivity

Биография автора

  • Dr. Jayanta Pal, Department of Physics, Dr. B. C. Roy Engineering College, Jemua Road, Fuljhore, Durgapur- 713206, West Bengal, India
    Department: Physics,Rank: Assistant Professor

Загрузки

Опубликован

2012-11-30

Выпуск

Том 3 № 3 (2012)

Раздел

Research Articles

Лицензия

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