Specific Contact Resistance of CuxO Thin Films Deposited by r. f. Sputtering Method

作者

  • Dr. Jayanta Pal Department of Physics, Dr. B. C. Roy Engineering College, Jemua Road, Fuljhore, Durgapur- 713206, West Bengal, India

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CuxO thin films##common.commaListSeparator## contact resistivity##common.commaListSeparator## bulk resistivity

摘要

This paper contains measurement of contact resistivity and bulk resistivity of CuxO (0<x<1) thin films deposited by r. f. sputtering method. The conditions for deposition of CuxO thin film were optimized by varying the r. f. power to vary the contact resistivity and bulk resistivity. Electrical characterizations were performed by Transmission Line Model (TLM) and Vertical Transmission Model (VTM) studies. The films deposited on glass substrate have contact resistivity in the range 2.53 - 15 W-cm2 and bulk resistivity in the range 0.35 - 0.96 W-cm.  Keywords: CuxO thin films, contact resistivity, bulk resistivity

作者簡介

  • ##submission.authorWithAffiliation##
    Department: Physics,Rank: Assistant Professor

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出版日期

2012-11-30

期號

卷 3 期 3 (2012)

分類

Research Articles

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